Honghong will provide you with any support you need!
Our professional Honghong team will be the first to respond and provide you with the best service to solve all your problems.
Honghong Semiconductor Lithography Light Source Solution
Easy mask lithography exposure based on Macrohon's high power ALE series UV LED light source
High-power UV LED lithography light source for large substrates, environmentally friendly alternative to high-power mercury lamps, efficiently retrofitting UV lithography equipment
Highly flexible, easy setup integration, single or multiple wavelength output configurations available, full control of broadband exposure spectrum in the 350-450nm range, high resolution down to 1μm/submicron range
Maximum output power up to 80W, consistent UV output over long periods of time, long operating life and cost advantages, no additional cooling time required
UV LED Solutions for Replacing High Power Mercury Lamps
Lithography and Exposure: Essential Processes for High-End Precision Manufacturing
UV lithography and exposure are the core technologies used by the semiconductor industry to produce a variety of high-end wafers and microscopic circuit structures. In the UV lithography process, ultraviolet light emitted from a light source is passed through a tiny lens or grating on a mask and then projected onto a photoresist layer to form the desired micro-pattern.
Disadvantages of mercury lamps: non-environmentally friendly, short life, unstable
For a long time, the semiconductor manufacturing field has used traditional high-power mercury lamps as the UV light source for lithography equipment. UV LEDs, with their unique technological and cost advantages, provide an ideal solution for the semiconductor manufacturing sector, as they can deliver stable, ultra-high-power UV radiation with a guaranteed long time and long operating life.
Integration: Cost, Space, Compatibility and Stability
Due to the unique advantages of UVLEDs, more and more research laboratories are using UVLED light sources to replace traditional mercury light boxes. However, the replacement of equipment is not a simple “key to open the door” process, need to consider the replacement cost, equipment volume and equipment compatibility, and more critical to ensure the stability of the exposure effect.
Photolithography Exposure: Honghong UV LED Ultraviolet Light Source
Honghong UVLED UV light source provides stable and ultra-high power UV radiation output with single peak (365 nm) or dual peak wavelength (365/405 nm and 405/435 nm) output configurations up to 80 W. It offers long life and cost advantages, no additional cooling time, ready-to-use, replaces traditional light box construction, and eliminates the need for a main beam folding mirror, It replaces traditional light box configurations and eliminates the need for main beam folding mirrors, heat sinks to absorb radiation in excess of 450 nm under shutter and filter components.
(Schematic diagram of UV lithography exposure process)
(UV LED spectrum)
Advantages of ALE Series High Power UVLED Light Source Integration Solution
Honghong (brand) ALE high power UVLED The combination of a light source and collimated flood exposure optics not only upgrades the traditional mask collimator light box to the UVLED The versatility and flexibility of the technology is also more affordable.
Honghong UV LED Application Areas
The overall system structure is shown in the figure, which consists of three parts: the light source input, the detection position and the detection output. The light source input consists of an ML light source and an automatic wavelength selector; the detection position holds different types of filters to be tested; and the detection output consists of a customized detection module and an ML spectrometer. The system detects narrow bandpass filters in the range of 540-600nm with a center wavelength of 580nm.
|
Backend lithography applications in the semiconductor, MEMS, LED wafer, power device and microfluidic industries utilize a wide variety of mask alignment systems. Manual, semi-automatic and fully automatic mask aligner systems are available to meet the requirements of any production environment. Macronix UVLED UV source solutions (ALE/1, ALE/1C and ALE/2) have been successfully integrated into a variety of mask alignment systems, producing excellent results in contact exposure, projection exposure applications, and are now seeing excellent uniformity, collimation (<2°), high resolution down to 0.7μm and high surface radiation power. |
 | 2. Broadband stepping systemWideband stepper systems play a crucial role in advanced packaging applications such as Fan-Out Wafer-Level Packaging (FOWLP), Wafer-Level Chip-Scale Packaging (WLCSP) or Through-Silicon Vias (TSV). complex microstructures, such as MEMS or LEDs, are important examples of what can be manufactured on highly specialized stepper devices. By combining individual LED modules around the i-, h- and g-lines into a single light path, the MAXTRON Broadband ALE Source provides complete control over the spectral composition of broadband exposures in the 350-450nm range, achieving resolutions down to 1μm or even sub-micron, and delivering higher radiation output. Honghong UV light source solutions offer the flexibility to choose the photosensitive advanced packaging materials that may be required in the process, replacing any conventional high power mercury arc lamps even above 1kW, providing superior system throughput. |
 | 3. Collimated Exposure System Mask aligners and steppers create layer after layer of precisely positioned and structured patterns to fabricate complex integrated circuits, compound semiconductors and other microelectronic devices. Many UV-curable applications require exposures as precise as semiconductor production, but do not require multiple lithographic steps with carefully aligned microscopic structured layers. Collimated UV light source exposure is preferred for this application. Macronix UV light source solutions can be integrated into applications that require UV flood exposure, and the modular product line allows you to select all components to meet the exposure requirements. |
 | 4. Photomask Detection A perfect photomask or photomask is an important reason for high throughput in photolithography applications. Defects and contamination can lead to pattern placement errors that are repeated on the production substrate. A photomask inspection system helps the shop identify its photomasks and wafers, safeguarding yield by reducing the risk of printing defective wafers and other substrates.
Integrating Macronix UVLED technology into a photomask inspection system for large photomasks allows the quality of incoming photomasks to be assessed and the markers to be recertified at regular intervals during the production process. The solution has three major advantages: |
 |
5.WEE Wafer Edge Exposure Click to enter: Honghong WEE Wafer Edge Exposure UVLED Light Source Solution |
Set product introduction
MT White Light Source
With a light output of up to 30W, the mercury-free design combines the radiant power and spectral characteristics of a mercury discharge lamp with the process advantages of LED technology.
Based on a modular platform, the system can combine up to five high-performance LEDs in the light path, providing flexible spectral composition and customized solutions. The light source is available in UV Curing Applications It is a perfect replacement for traditional 200W mercury lamps for spot curing operations in high volume production, providing more efficient energy conversion and application flexibility.
FWS poly automatic wavelength selector
With up to 15W of light output, LED industrial stability and TCO advantages, it can be easily integrated into new and old setups.
This light source supports multiple wavelength curing modes, allowing exposure at high wavelengths and high intensity curing at low wavelengths, resulting in a fully cured adhesive layer and a smooth, perfect surface. It is available in UV Curing Applications Ideal as a replacement for traditional 200W mercury lamps, it provides efficient and consistent curing results.
ALE/1C Ultraviolet Exposure System
Macrohon ALE/1C UV exposure system, combining up to 3 UV-LED emitters, provides narrowband and broadband UV radiation output in the range of 350-450 nm.
The total output power is up to 40 W and up to 50 W with an external cooler, making it a perfect replacement for high power mercury lamps. The system follows a decentralized design approach and is compact enough for industrial integration.
ALE/2 Ultraviolet Exposure System
Honghong ALE/2 UV exposure system provides narrowband and broadband UV radiation output in the range of 350-450nm; narrowband output power up to 70W, broadband output power up to 80W, completely replacing high-power discharge mercury lamps.
Decentralized design, consisting of a control subsystem (CSS) and one or more independent exposure subsystems (ESS), very compact structure for industrial integration.